Dr. Kamira Weinfeld
19/02/2026
אודיטוריום ע"ש דויד וואנג, בניין מידן, קומה 3
14:00
X-Ray Photoelectron Spectroscopy (XPS) is a powerful surface-sensitive technique widely used to support research activities across materials science, chemistry, physics, and related fields. Our XPS system presented here is equipped with dual charge neutralization, ensuring that the sample surface remains at a constant potential during analysis. This feature is essential for accurate binding energy measurement and for achieving high reproducibility, particularly when analyzing insulating or heterogeneous materials.
The instrument offers three complementary depth-profiling approaches: Angle-Resolved XPS (ARXPS), monoatomic argon ion sputtering (Mono-Ar), and argon cluster ion sputtering (GCIB). Each depth profiling technique is tailored to specific applications ranging from nondestructive near-surface analysis to depth-resolved chemical profiling.
In addition, the system includes Ultraviolet Photoelectron Spectroscopy (UPS) for electronic structure, Valence Band and Work Function direct measurement, as well as temperature XPS analysis, enabling in situ investigations of temperature-dependent materials.